Article 10212

Title of the article

MODELING OF TECHNOLOGY OF THIN TENZORESISTENCE FILM DEPOSITION

Authors

Kuchumov Evgeniy Vladimirovich, candidate of technical sciences, senior staff scientist, Research Institute of Physical Measurements, evgenii_kuchumov@mail.ru
Popchenkov Dmitriy Valentinovich, head of the research laboratory 621, Research Institute of Physical Measurements, volohov@niifi.ru

Index UDK

51.74

Abstract

This article defines few basic principles needed for development of elementary mathematical model by vacuum evaporation.

Key words

mathematical modeling, thin film deposition, vacuum evaporation.

Download PDF

 

Дата создания: 25.02.2015 10:49
Дата обновления: 25.02.2015 15:58